Selective growth of tantalum nitride and hafnium nitride thin films on OTS patterned SI(100) substrates by MOCVD method

  • B. C. Kang
  • , A. Baunemann
  • , Y. Kim
  • , J. H. Lee
  • , D. Y. Jung
  • , H. Parala
  • , A. Devi
  • , R. A. Fischer
  • , J. H. Boo

Research output: Contribution to conference › Paper › peer-review

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