Selective growth of tantalum nitride and hafnium nitride thin films on OTS patterned SI(100) substrates by MOCVD method

B. C. Kang, A. Baunemann, Y. Kim, J. H. Lee, D. Y. Jung, H. Parala, A. Devi, R. A. Fischer, J. H. Boo

Research output: Contribution to conferencePaperpeer-review

Fingerprint

Dive into the research topics of 'Selective growth of tantalum nitride and hafnium nitride thin films on OTS patterned SI(100) substrates by MOCVD method'. Together they form a unique fingerprint.

Engineering

Physics

Material Science