Selective growth of TiO2 thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods

B. C. Kang; J. H. Lee; H. Y. Chae; D. Y. Jung; S. B. Lee; J. H. Boo

Selective growth of TiO₂ thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods

B. C. Kang
, J. H. Lee
, H. Y. Chae
, D. Y. Jung
, S. B. Lee
, J. H. Boo

Chemistry

Sungkyunkwan University

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

A study was performed on the selective growth of TiO₂ thin films on a patterned Si(100) surface. The techniques used were metalorganic chemical vapor deposition and microcontact printing methods. The data obtained from Auger electron spectroscopy and x-ray diffraction analysis showed that the deposited TiO₂ material was stoichiometric, polycrystalline, and consisted of anatase phase.

Original language	English
Pages (from-to)	1773-1776
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	4
State	Published - Jul 2003

Cite this

@article{24a9f59c3bef4f4db00b0cd17d2f77c4,

title = "Selective growth of TiO2 thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods",

abstract = "A study was performed on the selective growth of TiO2 thin films on a patterned Si(100) surface. The techniques used were metalorganic chemical vapor deposition and microcontact printing methods. The data obtained from Auger electron spectroscopy and x-ray diffraction analysis showed that the deposited TiO2 material was stoichiometric, polycrystalline, and consisted of anatase phase.",

author = "Kang, \{B. C.\} and Lee, \{J. H.\} and Chae, \{H. Y.\} and Jung, \{D. Y.\} and Lee, \{S. B.\} and Boo, \{J. H.\}",

year = "2003",

month = jul,

language = "English",

volume = "21",

pages = "1773--1776",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "4",

}

Selective growth of TiO₂ thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods. / Kang, B. C.; Lee, J. H.; Chae, H. Y. et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 4, 07.2003, p. 1773-1776.

Research output: Contribution to journal › Article › peer-review

TY - JOUR

T1 - Selective growth of TiO2 thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods

AU - Kang, B. C.

AU - Lee, J. H.

AU - Chae, H. Y.

AU - Jung, D. Y.

AU - Lee, S. B.

AU - Boo, J. H.

PY - 2003/7

Y1 - 2003/7

N2 - A study was performed on the selective growth of TiO2 thin films on a patterned Si(100) surface. The techniques used were metalorganic chemical vapor deposition and microcontact printing methods. The data obtained from Auger electron spectroscopy and x-ray diffraction analysis showed that the deposited TiO2 material was stoichiometric, polycrystalline, and consisted of anatase phase.

AB - A study was performed on the selective growth of TiO2 thin films on a patterned Si(100) surface. The techniques used were metalorganic chemical vapor deposition and microcontact printing methods. The data obtained from Auger electron spectroscopy and x-ray diffraction analysis showed that the deposited TiO2 material was stoichiometric, polycrystalline, and consisted of anatase phase.

UR - https://www.scopus.com/pages/publications/0141681029

M3 - Article

AN - SCOPUS:0141681029

SN - 1071-1023

VL - 21

SP - 1773

EP - 1776

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 4

ER -

Selective growth of TiO₂ thin films on Si(100) surfaces by combination of metalorganic chemical vapor deposition and microcontact printing methods

Abstract

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